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Vacuum Plating Silver Thin Film Deposition Magnetron Sputtering System
The equipment features a reasonable structure, delivering uniform coating quality with high pumping speed. It offers a short cycle time, high efficiency, and easy operation, combined with low energy consumption and stable performance. It is widely applied in automotive, audio, small appliances, computers, timepieces, toys, mobile phones, reflective cups, and cosmetic industries.
DC magnetron sputtering coating machines are typically utilized for direct sputtering coating on various substrates including plastics, glass, metals, and ceramics. With over 10 years of experience in manufacturing magnetrons—available in rectangular, cylindrical, and circular configurations—we develop targets that can be directly cooled or bonded to fit most industrial requirements.
Magnetic fields define the behavior and properties of ion-charged particles used for sputtering. Advanced modeling software enhances the productivity, applicability, and reproducibility of the sputtering process.
| Technical Specifications | ||||
|---|---|---|---|---|
| Model Number | SP-1000 | SP-1200 | SP-1400 | SP-1800 |
| Vacuum Chamber Dim. (D*H) | 1000*1100 | 1200*1400 | 1400*1600 | 1800*2000 |
| Chamber Material | Carbon steel, SUS304 or SUS316L | |||
| Sputtering Cathodes | ≥1 sets, DC sputtering system, cylindrical or rectangle | |||
| Pumping System | Turbo molecular pumps or diffusion pump + mechanical pump | |||
| Pumping Time | Atmosphere to 5.0*10-2Pa in less than 8 minutes | |||
| Ultimate Vacuum | 5.0*10-4 Pa | |||
| Working Mode | Automatic or Manual mode via PLC touch screen | |||
| Total Power | 40-100kW | 70-1000kW | ||
*All specifications can be customized according to specific requests.
We provide all necessary components for daily production maintenance:
