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| Customization: | Available |
|---|---|
| After-sales Service: | Onlin |
| Warranty: | 1 |
The Thermal Atomic Layer Deposition System is a single-wafer deposition system specially designed for scientific research and small-scale experiments of industrialization. It is widely used in the fields of micro-electronic, nano material, optical film, solar battery etc.
| Wafer Dimension | 8 inch and below |
| Wafer temperature | RT-400ºC, Controlling precision ±0.1ºC |
| Number of precursor | Three precursor lines, optional more lines |
| Temperature of precursor lines | RT-200ºC, Controlling precision ±0.1ºC |
| Temperature of source bottles | RT-200ºC, Controlling precision ±0.1ºC |
| ALD Valve | Swagelok ALD swift valve |
| Background vacuum | <5*10⁻³ Torr |
| Gas carrier system | N₂ or Ar |
| Growing mode | Consecutive or interval deposition mode |
| Controlling system | PLC plus touch screen or display |
| Power supply | 50-60Hz, 220V/20A AC |
| Deposition Heterogeneity | Heterogeneity < ±1% |
| Dimension of the instrument | 600mm x 600mm x 1100mm |






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